Maskless lithography
Photomask-free micro-patterning for rapid device prototyping
Make · measure · understand
Facilities
APPND’s experimental workflow connects nanomaterial synthesis and post-processing with thin-film device fabrication, electrical characterization, and electrochemical analysis.
Device integration & measurement
Parameter analyzers
Keithley 4200SCS · HP4145B
Probe station
Current–voltage measurement of transistors, memories, and sensors
Thermal evaporator
Metal and electrode deposition for device fabrication
Sputtering system
Metal and dielectric thin-film processing
LCR meter
Capacitance, impedance, and frequency-response analysis
Nanomaterial synthesis & processing
Hydrothermal reactor
Hydrothermal synthesis of metal and semiconductor nanostructures
Tube furnace / CVD
Thermal treatment and vapor-phase material growth
Glovebox systems
Air-sensitive material synthesis and device handling
Freeze dryer
Low-damage drying for porous and high-surface-area structures
Spin & bar coaters
Uniform thin-film and large-area coating from inks
Ultrasonicator
Nanoparticle dispersion, mixing, and exfoliation
General analysis & preparation
Four-point probe
Four-terminal sheet-resistance measurement of conductive films
Optical microscopy
Surface, pattern, and device inspection
UV ozone treatment
Organic-residue removal and surface-energy control
Clean bench
Particle-reduced sample preparation and device assembly
Fume hoods
Safe wet-chemical synthesis and sample processing
Microbalance
Mass measurement for formulations and electrochemical samples
Equipment access: capabilities may combine APPND-owned instruments with DGIST shared facilities. Contact the laboratory in advance to confirm availability, training requirements, and sample compatibility.